Fuse lines and plugs for semiconductor devices

ABSTRACT

Embodiments herein describe techniques for fuse lines and plugs formation. A semiconductor device may include a fuse line having a nominal fuse segment abutted to a necked fuse segment. The nominal fuse segment may be wider than the necked fuse segment. A first spacer may be along a first side of the fuse line and a second spacer along a second side opposite to the first side of the fuse line. The first spacer may include a part having a width at least twice a width of a part of the second spacer. A plug within a vicinity of the necked fuse segment may have a plug width that may be at least twice a plug with of a plug of an interconnect line outside the vicinity. Other embodiments may also be described and claimed.

CROSS REFERENCE TO RELATED APPLICATIONS

The present application is a national phase entry under 35 U.S.C. § 371of International Application No. PCT/US2016/069532, filed Dec. 30, 2016,entitled “FUSE LINES AND PLUGS FOR SEMICONDUCTOR DEVICES”, whichdesignated, among the various States, the United States of America. TheSpecification of the PCT/US2016/069532 Application is herebyincorporated by reference.

FIELD

Embodiments of the disclosure are in the field of semiconductor devicesand processing and, in particular, fuse lines and plugs formation forback end of line (BEOL) interconnects.

BACKGROUND

A semiconductor device, or simply a device, may be electrically coupledby conductive interconnect structures, which may include interconnectlines distributed in various levels above a substrate. Sometimes,interconnect lines may be referred to as metal lines, conductive lines,conductive traces, or simply traces. Interconnect lines distributed indifferent levels may be coupled to one another by vias. On the otherhand, interconnect lines on a same level may be separated by dielectriclines, e.g., spacers. In addition, an interconnect line may beinterrupted by non-conductive spaces or interruptions, referred to asline ends, plugs, or cuts. The plugs may be nonconductive (dielectric)spaces or interruptions that break a continuous interconnect line intomultiple segments at a given level. A semiconductor device may alsoinclude fuse lines, which may be a sacrificial device employed toprovide overcurrent protection for the semiconductor device. A fuse linemay have a low resistance and may create a permanently non-conductivepath when the current across the semiconductor device exceeds a certainlevel. Sometimes, a fuse line may include a weak link along the fuseline to expedite fuse programming while maintaining overall reliabilityof the semiconductor device. However, such a weak link may create shortsaround the weak link of the fuse line once the fuse line is blown, whichmay compromise the integrity of the semiconductor device.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments will be readily understood by the following detaileddescription in conjunction with the accompanying drawings. To facilitatethis description, like reference numerals designate like structuralelements. Embodiments are illustrated by way of example and not by wayof limitation in the figures of the accompanying drawings.

FIG. 1 schematically illustrates a three-dimensional view of an examplesemiconductor device including plugs and a fuse line separated fromother interconnect lines by spacers, in accordance with someembodiments.

FIGS. 2(a)-2(b) schematically illustrate top-down views of examplesemiconductor devices including a fuse line having a nominal fusesegment and a necked fuse segment between two spacers, in accordancewith some embodiments.

FIG. 3 schematically illustrates a top-down view of an examplesemiconductor device including multiple plugs and a fuse line having anominal fuse segment and a necked fuse segment between two spacers, inaccordance with some embodiments.

FIGS. 4(a)-4(e) schematically illustrate a process for forming anexample semiconductor device including multiple fuse lines having anominal fuse segment and a necked fuse segment between spacers, inaccordance with some embodiments.

FIG. 5 schematically illustrates another process for forming an examplesemiconductor device including a fuse line having a nominal fuse segmentand a necked fuse segment between spacers, in accordance with someembodiments.

FIG. 6 schematically illustrates an interposer implementing one or moreembodiments of the disclosure, in accordance with some embodiments.

FIG. 7 schematically illustrates a computing device built in accordancewith an embodiment of the disclosure, in accordance with someembodiments.

DETAILED DESCRIPTION

In accordance with some embodiments described further below, asemiconductor device may include a fuse line separated from otherinterconnect lines by spacers. A fuse line may include a weak link alongthe fuse line which may blow (e.g., form a high resistance path (opencircuit)) when the current across the fuse line exceeds a certain level.The weak link may be referred to as the necked fuse segment, and otherparts of the fuse line may be referred to as nominal fuse segments. Inembodiments, a spacer next to the fuse line may have a width larger thanother spacers. A wider spacer next to the fuse line may provide betterseparation between the fuse line and other interconnect lines, hencepreventing potential shorts around the necked fuse segment of the fuseline once the fuse line is blown. An interconnect line may be brokeninto multiple segments by plugs. In embodiments, the plugs within avicinity of the necked fuse segment of the fuse line may be wider thanplugs in other interconnect lines in the semiconductor device. Withwider spacer around the fuse line and/or wider plugs within the vicinityof the necked fuse segment of the fuse line, embodiments herein maymaintain the integrity of the semiconductor device once the fuse line isblown around the necked fuse segment.

In embodiments, a semiconductor device may include a fuse line disposedover a substrate, where the fuse line may include a nominal fuse segmentabutted to a necked fuse segment. The nominal fuse segment may have anominal lateral width, and the necked fuse segment may have a neckedlateral width that is smaller than the nominal lateral width. Inaddition, the semiconductor device may include a first spacer along afirst side of the fuse line and a second spacer along a second sideopposite to the first side of the fuse line. The first spacer mayinclude a first part of the first spacer that is next to the nominalfuse segment, and the second spacer may include a first part of thesecond spacer that is next to the nominal fuse segment. The first partof the first spacer may have a first width, the first part of the secondspacer may have a second width, and the second width may be at leasttwice the first width.

In embodiments, a semiconductor device may include a fuse line disposedover a substrate, where the fuse line may include a nominal fuse segmentabutted to a necked fuse segment. The nominal fuse segment may have anominal lateral width, and the necked fuse segment may have a neckedlateral width that is smaller than the nominal lateral width. Inaddition, the semiconductor device may include a first spacer along afirst side of the fuse line and a second spacer along a second sideopposite to the first side of the fuse line. The first spacer mayinclude a first part of the first spacer that is next to the nominalfuse segment, and the second spacer may include a first part of thesecond spacer that is next to the nominal fuse segment. Thesemiconductor device may further include a first plug of an interconnectline in parallel with the fuse line, and a second plug next to the firstspacer or the second spacer, and at least a part of the second plug islocated orthogonal to the necked fuse segment of the fuse line. Thefirst plug may have a first plug width, and the second plug may have asecond plug width that is at least twice the first plug width.

In embodiments, a method for fabricating a fuse structure in asemiconductor device may include patterning a first mandrel line and asecond mandrel line in parallel to the first mandrel line disposed overa substrate. The first mandrel line and the second mandrel line may forma narrower space, and a wider nominal space abutted to the narrowerspace. The method may further include forming a first spacer along edgesof the first mandrel line, and forming a second spacer along edges ofthe second mandrel line. The first spacer may include a first spacersegment disposed within the nominal space and a second spacer segmentdisposed within the narrower space, where the first spacer segment andthe second spacer segment have a first lateral width. The second spacermay include a third spacer segment disposed within the nominal space anda fourth spacer segment disposed within the narrower space, and thethird spacer segment and the fourth spacer segment have a second lateralwidth that is at least twice the first lateral width. The method mayfurther include removing the first mandrel line selectively from thefirst spacer and removing the second mandrel line selectively from thesecond spacer. In addition, the method may include forming a fuse linebetween the first spacer and the second spacer. The fuse line mayinclude a nominal fuse segment within the nominal space and a neckedfuse segment within the narrower space.

In the following description, various aspects of the illustrativeimplementations will be described using terms commonly employed by thoseskilled in the art to convey the substance of their work to othersskilled in the art. However, it will be apparent to those skilled in theart that the present disclosure may be practiced with only some of thedescribed aspects. For purposes of explanation, specific numbers,materials and configurations are set forth in order to provide athorough understanding of the illustrative implementations. However, itwill be apparent to one skilled in the art that the present disclosuremay be practiced without the specific details. In other instances,well-known features are omitted or simplified in order not to obscurethe illustrative implementations.

Various operations will be described as multiple discrete operations, inturn, in a manner that is most helpful in understanding the presentdisclosure. However, the order of description should not be construed toimply that these operations are necessarily order dependent. Inparticular, these operations may not be performed in the order ofpresentation.

For the purposes of the present disclosure, the phrase “A and/or B”means (A), (B), or (A and B). For the purposes of the presentdisclosure, the phrase “A, B, and/or C” means (A), (B), (C), (A and B),(A and C), (B and C), or (A, B and C).

The terms “over,” “under,” “between,” “above,” and “on” as used hereinmay refer to a relative position of one material layer or component withrespect to other layers or components. For example, one layer disposedover or under another layer may be directly in contact with the otherlayer or may have one or more intervening layers. Moreover, one layerdisposed between two layers may be directly in contact with the twolayers or may have one or more intervening layers. In contrast, a firstlayer “on” a second layer is in direct contact with that second layer.Similarly, unless explicitly stated otherwise, one feature disposedbetween two features may be in direct contact with the adjacent featuresor may have one or more intervening features.

The description may use the phrases “in an embodiment,” or “inembodiments,” which may each refer to one or more of the same ordifferent embodiments. Furthermore, the terms “comprising,” “including,”“having,” and the like, as used with respect to embodiments of thepresent disclosure, are synonymous.

The term “coupled with,” along with its derivatives, may be used herein.“Coupled” may mean one or more of the following. “Coupled” may mean thattwo or more elements are in direct physical or electrical contact.However, “coupled” may also mean that two or more elements indirectlycontact each other, but yet still cooperate or interact with each other,and may mean that one or more other elements are coupled or connectedbetween the elements that are said to be coupled with each other. Theterm “directly coupled” may mean that two or more elements are in directcontact.

In various embodiments, the phrase “a first feature formed, deposited,or otherwise disposed on a second feature” may mean that the firstfeature is formed, deposited, or disposed over the second feature, andat least a part of the first feature may be in direct contact (e.g.,direct physical and/or electrical contact) or indirect contact (e.g.,having one or more other features between the first feature and thesecond feature) with at least a part of the second feature.

Where the disclosure recites “a” or “a first” element or the equivalentthereof, such disclosure includes one or more such elements, neitherrequiring nor excluding two or more such elements. Further, ordinalindicators (e.g., first, second, or third) for identified elements areused to distinguish between the elements, and do not indicate or imply arequired or limited number of such elements, nor do they indicate aparticular position or order of such elements unless otherwisespecifically stated.

As used herein, the term “circuitry” may refer to, be part of, orinclude an Application Specific Integrated Circuit (ASIC), an electroniccircuit, a processor (shared, dedicated, or group), and/or memory(shared, dedicated, or group) that execute one or more software orfirmware programs, a combinational logic circuit, and/or other suitablehardware components that provide the described functionality. As usedherein, “computer-implemented method” may refer to any method executedby one or more processors, a computer system having one or moreprocessors, a mobile device such as a smartphone (which may include oneor more processors), a tablet, a laptop computer, a set-top box, agaming console, and so forth.

Implementations of the disclosure may be formed or carried out on asubstrate, such as a semiconductor substrate. In one implementation, thesemiconductor substrate may be a crystalline substrate formed using abulk silicon or a silicon-on-insulator substructure. In otherimplementations, the semiconductor substrate may be formed usingalternate materials, which may or may not be combined with silicon, thatinclude but are not limited to germanium, indium antimonide, leadtelluride, indium arsenide, indium phosphide, gallium arsenide, indiumgallium arsenide, gallium antimonide, or other combinations of groupIII-V or group IV materials. Although a few examples of materials fromwhich the substrate may be formed are described here, any material thatmay serve as a foundation upon which a semiconductor device may be builtfalls within the spirit and scope of the present disclosure.

A plurality of transistors, such as metal-oxide-semiconductorfield-effect transistors (MOSFET or simply MOS transistors), may befabricated on the substrate. In various implementations of thedisclosure, the MOS transistors may be planar transistors, nonplanartransistors, or a combination of both. Nonplanar transistors includeFinFET transistors such as double-gate transistors and tri-gatetransistors, and wrap-around or all-around gate transistors such asnanoribbon and nanowire transistors. Although the implementationsdescribed herein may illustrate only planar transistors, it should benoted that the disclosure may also be carried out using nonplanartransistors.

Each MOS transistor includes a gate stack formed of at least two layers,a gate dielectric layer and a gate electrode layer. The gate dielectriclayer may include one layer or a stack of layers. The one or more layersmay include silicon oxide, silicon dioxide (SiO2) and/or a high-kdielectric material. The high-k dielectric material may include elementssuch as hafnium, silicon, oxygen, titanium, tantalum, lanthanum,aluminum, zirconium, barium, strontium, yttrium, lead, scandium,niobium, and zinc. Examples of high-k materials that may be used in thegate dielectric layer include, but are not limited to, hafnium oxide,hafnium silicon oxide, lanthanum oxide, lanthanum aluminum oxide,zirconium oxide, zirconium silicon oxide, tantalum oxide, titaniumoxide, barium strontium titanium oxide, barium titanium oxide, strontiumtitanium oxide, yttrium oxide, aluminum oxide, lead scandium tantalumoxide, and lead zinc niobate. In some embodiments, an annealing processmay be carried out on the gate dielectric layer to improve its qualitywhen a high-k material is used.

The gate electrode layer is formed on the gate dielectric layer and mayconsist of at least one P-type work function metal or N-type workfunction metal, depending on whether the transistor is to be a PMOS oran NMOS transistor. In some implementations, the gate electrode layermay consist of a stack of two or more metal layers, where one or moremetal layers are work function metal layers and at least one metal layeris a fill metal layer. Further metal layers may be included for otherpurposes, such as a barrier layer.

For a PMOS transistor, metals that may be used for the gate electrodeinclude, but are not limited to, ruthenium, palladium, platinum, cobalt,nickel, and oxygen-containing metal alloys such as conductive metaloxides, e.g., ruthenium oxide. A P-type metal layer will enable theformation of a PMOS gate electrode with a work function that is betweenabout 4.9 eV and about 5.2 eV. For an NMOS transistor, metals that maybe used for the gate electrode include, but are not limited to, hafnium,zirconium, titanium, tantalum, aluminum, alloys of these metals, andcarbon-containing metal alloys such as metal carbides of these metals,for example hafnium carbide, zirconium carbide, titanium carbide,tantalum carbide, and aluminum carbide. An N-type metal layer willenable the formation of an NMOS gate electrode with a work function thatis between about 3.9 eV and about 4.2 eV.

In some implementations, when viewed as a cross-section of thetransistor along the source-channel-drain direction, the gate electrodemay consist of a “U”-shaped structure that includes a bottom portionsubstantially parallel to the surface of the substrate and two sidewallportions that are substantially perpendicular to the top surface of thesubstrate. In another implementation, at least one of the metal layersthat form the gate electrode may simply be a planar layer that issubstantially parallel to the top surface of the substrate and does notinclude sidewall portions substantially perpendicular to the top surfaceof the substrate. In further implementations of the disclosure, the gateelectrode may consist of a combination of U-shaped structures andplanar, non-U-shaped structures. For example, the gate electrode mayconsist of one or more U-shaped metal layers formed atop one or moreplanar, non-U-shaped layers.

In some implementations of the disclosure, a pair of sidewall spacersmay be formed on opposing sides of the gate stack that bracket the gatestack. The sidewall spacers may be formed from materials such assilicon, nitrogen, carbon, and oxygen, for example silicon nitride,silicon oxide, silicon carbide, silicon nitride doped with carbon, andsilicon oxynitride. Processes for forming sidewall spacers are wellknown in the art and generally include deposition and etching processsteps. In an alternate implementation, a plurality of spacer pairs maybe used, for instance, two pairs, three pairs, or four pairs of sidewallspacers may be formed on opposing sides of the gate stack.

As is well known in the art, source and drain regions are formed withinthe substrate adjacent to the gate stack of each MOS transistor. Thesource and drain regions are generally formed using either animplantation/diffusion process or an etching/deposition process. In theformer process, dopants such as boron, aluminum, antimony, phosphorous,or arsenic may be ion-implanted into the substrate to form the sourceand drain regions. An annealing process that activates the dopants andcauses them to diffuse further into the substrate typically follows theion implantation process. In the latter process, the substrate may firstbe etched to form recesses at the locations of the source and drainregions. An epitaxial deposition process may then be carried out to fillthe recesses with material that is used to fabricate the source anddrain regions. In some implementations, the source and drain regions maybe fabricated using a silicon alloy such as silicon germanium or siliconcarbide. In some implementations the epitaxially deposited silicon alloymay be doped in situ with dopants such as boron, arsenic, orphosphorous. In further embodiments, the source and drain regions may beformed using one or more alternate semiconductor materials such asgermanium or a group III-V material or alloy. And in furtherembodiments, one or more layers of metal and/or metal alloys may be usedto form the source and drain regions.

One or more interlayer dielectrics (ILD) are deposited over the MOStransistors. The ILD layers may be formed using dielectric materialsknown for their applicability in integrated circuit structures, such aslow-k dielectric materials. The dielectric materials may containelements such as silicon, oxygen, carbon, nitrogen, fluorine, andhydrogen. Examples of dielectric materials that may be used include, butare not limited to, silicon dioxide (SiO2), carbon doped oxide (CDO),silicon nitride, organic polymers such as perfluorocyclobutane orpolytetrafluoroethylene, fluorosilicate glass (FSG), and organosilicatessuch as silsesquioxane, siloxane, or organosilicate glass. The ILDlayers may include pores or air gaps to further reduce their dielectricconstant.

FIG. 1 schematically illustrates a three-dimensional view of an examplesemiconductor device 100 including plugs, e.g., a plug 1065, a plug1067, and a plug 1083, and a fuse line, e.g., a fuse line 1001,separated from other interconnect lines, e.g., an interconnect line1011, and an interconnect line 1031, by spacers, e.g., a spacer 1021, aspacer 1041, a spacer 1061, and a spacer 1081, in accordance with someembodiments.

In embodiments, the semiconductor device 100 may include a substrate1000. Multiple interconnect lines, e.g., the interconnect line 1011 andthe interconnect line 1031, may be disposed over the substrate 1000, inparallel with the fuse line 1001. The plug 1065 and the plug 1067 mayinterrupt the interconnect line 1011, while the plug 1083 may interruptthe interconnect line 1031. The fuse line 1001, the interconnect line1011, and the interconnect line 1031 may be separated by dielectricmaterial, e.g., the spacer 1021, the spacer 1041, the spacer 1061, andthe spacer 1081. Furthermore, the fuse line 1001 may include a neckedfuse segment 1005, a nominal fuse segment 1003, and a nominal fusesegment 1007. The nominal fuse segment 1003 and the nominal fuse segment1007 abutted to the necked fuse segment 1005 may be wider than thenecked fuse segment 1005. Hence, the necked fuse segment 1005 may be aweak link of the fuse line 1001.

In embodiments, the substrate 1000 may be any substrate suitable forforming a monolithically integrated electrical, optical, ormicro-electromechanical (MEM) device, generally referred to herein as asemiconductor device, or a device. Exemplary substrates may include asemiconductor substrate, semiconductor-on-insulator (SOI) substrate, aninsulator substrate (e.g., sapphire), or other substrate. In oneexemplary embodiment, the substrate 1000 may include a substantiallymonocrystalline semiconductor, such as, but not limited to, silicon.

In embodiments, active devices, not depicted, such as transistors,photodetectors, lasers, memory cells, and the like may be disposed in oron the substrate 1000. One or more passive device, such as resistors,capacitors, inductors, optical waveguides, or the like may also bedisposed in or on the substrate 1000.

In embodiments, the interconnect line 1011 and the interconnect line1031 may include any conductive material suitable for a semiconductordevice. For example, the interconnect line 1011 and the interconnectline 1031 may include doped polysilicon. In other embodiments, theinterconnect line 1011 and the interconnect line 1031 may be metallizedand may include one or more of copper (Cu), Tungsten (W), aluminum (Al),titanium OR, platinum (Pt), cobalt (Co), tantalum (Ta), an alloy of Cu,W, Al, Ti, Pt, Co, or Ta, or other conductive material.

The fuse line 1001 may include the necked fuse segment 1005, the nominalfuse segment 1003, and the nominal fuse segment 1007. The necked fusesegment 1005 may have a necked lateral width, while the nominal fusesegment 1003 and the nominal fuse segment 1007 may have a nominallateral width that is larger than the necked lateral width. The neckedfuse element 1005 may blow when the current across the fuse line 1001exceeds a certain level. The fuse line 1001 may include one or more ofcopper (Cu), Tungsten (W), aluminum (Al), titanium (Ti), platinum (Pt),cobalt (Co), tantalum (Ta), an alloy of Cu, W, Al, Ti, Pt, Co, or Ta, orother conductive material.

In embodiments, the spacer 1021, the spacer 1041, the spacer 1061, andthe spacer 1081 may include any dielectric material known in the art tobe suitable for electrically isolating the fuse line 1001, theinterconnect line 1011, and the interconnect line 1031 from each other.Many materials may be in use in the art, such as, but not limited to,silicon dioxide (SiO₂), silicon nitride (Si₃N₄), silicon oxynitride(SiON), a low-k material, or an ultra low-k material. A low-k materialmay be a material with a small dielectric constant relative to silicondioxide, such as fluorine-doped silicon dioxide, carbon-doped silicondioxide, or porous silicon dioxide. An ultra low-k material may have adielectric constant even smaller than the low-k material. An ultra low-kmaterial may include carbon doped silicon dioxide/nitride, or porousdielectrics. The spacer 1041 next to the fuse line 1001 may be widerthan other spacers, e.g., the spacer 1021, or the spacer 1061, so thatwhen blown, the fuse line 1001 would not create a potential short aroundthe necked fuse segment 1005, e.g., not to create a short for theinterconnect line 1031.

The plug 1065, the plug 1067, and the plug 1083 may interrupt theinterconnect line 1011 or the interconnect line 1031. The plug 1065 maybe within a vicinity of the necked fuse segment 1005, e.g., at least apart of the plug 1065 is located orthogonal to the necked fuse segment1005. Other plugs, e.g., the plug 1067 and the plug 1083, may not bewithin the vicinity of the necked fuse segment 1005. The plug 1065 maybe wider than the plug 1067 and the plug 1083. Hence, when blown, thefuse line 1001 would not create a potential short around the necked fusesegment 1005, e.g., not to create a short for the interconnect line1011.

FIGS. 2(a)-2(b) schematically illustrate top-down views of examplesemiconductor devices, e.g., a device 200 or a device 210, including afuse line, e.g., a fuse line 2001 or a fuse line 2101, having a nominalfuse segment and a necked fuse segment between two spacers, inaccordance with some embodiments. The device 200 or the device 210 maybe an example of the device 100 shown in FIG. 1, where the fuse line2001 or the fuse line 2101 may be an example of the fuse line 1001.

FIG. 2(a) illustrates a top-down view of the device 200 having the fuseline 2001. A spacer 2021 may be next to the fuse line 2001 along a firstside of the fuse line 2001, and a spacer 2041 may be next to the fuseline 2001 along a second side of the fuse line 2001 opposite to thefirst side of the fuse line 2001 where the spacer 2021 is located. Thespacer 2021, the spacer 2041, and the fuse 2001 may together form arectangle in top-down view.

The fuse line 2001 may include a necked fuse segment 2005, a nominalfuse segment 2003, and a nominal fuse segment 2007. The necked fusesegment 2005, the nominal fuse segment 2003, and the nominal fusesegment 2007 may each be a rectangle. The nominal fuse segment 2003 andthe nominal fuse segment 2007 may be abutted to the necked fuse segment2005. The nominal fuse segment 2003 or the nominal fuse segment 2007 mayhave a nominal lateral width W1, and the necked fuse segment 2005 mayhave a necked lateral width W2 that is smaller than the nominal lateralwidth W1. In embodiments, the nominal lateral width W1 may be equal to acritical dimension, e.g., a minimal feature size, for an interconnectline based on a design rule. In embodiments, the necked lateral width W2may be in a range of 90% to 25% of the nominal lateral width W1.

The spacer 2021 may include a first part 2023 next to the nominal fusesegment 2003, a second part 2025 next to the necked fuse segment 2005,and a third part 2027 next to the nominal fuse segment 2007. The firstpart 2023 and the third part 2027 may have a width W3. In someembodiments, the necked fuse segment 2005 may be located around themiddle edge of the nominal fuse segment 2003, so that the second part2025 may be wider than the first part 2023 or the third part 2027.

The spacer 2041 may include a first part 2043 next to the nominal fusesegment 2003, a second part 2045 next to the necked fuse segment 2005,and a third part 2047 next to the nominal fuse segment 2007. The firstpart 2043 and the third part 2047 may have a width W4. In someembodiments, the necked fuse segment 2005 may be located around themiddle edge of the nominal fuse segment 2003, so that the second part2045 may be wider than the first part 2043 or the third part 2047.

In embodiments, the width W4 of the first part 2043 of the spacer 2041may be at least twice the width W3 of the first part 2023 of the spacer2021. In some embodiments, the width W4 may be exactly twice the widthW3, which may be more efficient to be formed. In some other embodiments,the width W4 may be substantially around twice the width W3, with aslight variation due to manufacturing variation (e.g., +/−10% of 2×). Infurther embodiments, the width W4 may be three times or more the widthW3. In some other embodiments, it may be the case that the width W3 ofthe first part 2023 of the spacer 2021 may be at least twice the widthW4 of the first part 2043 of the spacer 2041.

FIG. 2(b) illustrates a top-down view of the device 210 having the fuseline 2101. A spacer 2121 may be next to the fuse line 2101 along a firstside of the fuse line 2101, and a spacer 2141 may be next to the fuseline 2101 along a second side of the fuse line 2101 opposite to thefirst side of the fuse line 2101 where the spacer 2121 is located. Thespacer 2121, the spacer 2141, and the fuse 2101 may together form arectangle in top-down view.

The fuse line 2101 may include a necked fuse segment 2105, a nominalfuse segment 2103, and a nominal fuse segment 2107. The necked fusesegment 2105, the nominal fuse segment 2103, and the nominal fusesegment 2107 may each be a rectangle. The nominal fuse segment 2103 orthe nominal fuse segment 2107 may have a nominal lateral width W5, andthe necked fuse segment 2105 may have a necked lateral width W6 that issmaller than the nominal lateral width W5. In embodiments, the nominallateral width W5 may be equal to a critical dimension, e.g., a minimalfeature size, for an interconnect line based on a design rule. Inembodiments, the necked lateral width W6 may be in a range of 90% to 25%of the nominal lateral width W5.

The spacer 2121 may include a first part 2123 next to the nominal fusesegment 2103, a second part 2125 next to the necked fuse segment 2105,and a third part 2127 next to the nominal fuse segment 2107. The firstpart 2123 and the third part 2127 may have a width W7. In someembodiments, the necked fuse segment 2105 may be aligned with one edge,e.g., an edge next to the spacer 2141, of the nominal fuse segment 2103or the nominal fuse segment 2107, so that the second part 2125 may bewider than the first part 2123 or the third part 2127.

The spacer 2141 may include a first part 2143 next to the nominal fusesegment 2103, a second part 2145 next to the necked fuse segment 2105,and a third part 2147 next to the nominal fuse segment 2107. The firstpart 2143 and the third part 2147 may have a width W8. In someembodiments, the necked fuse segment 2105 may be aligned with one edge,e.g., an edge next to the spacer 2141, of the nominal fuse segment 2103or the nominal fuse segment 2107, so that the second part 2145 may be ofa same width as the first part 2143 or the third part 2147.

In embodiments, the width W8 of the first part 2143 of the spacer 2141may be at least twice the width W7 of the first part 2123 of the spacer2121. In some other embodiments, it may be the case that the width W7 ofthe first part 2123 of the spacer 2121 may be at least twice the widthW8 of the first part 2143 of the spacer 2141.

FIG. 3 schematically illustrates a top-down view of an examplesemiconductor device 300 including plugs, e.g., a plug 3065, a plug3067, a plug 3083, and a plug 3085, and a fuse line, e.g., a fuse line3001, having a nominal fuse segment and a necked fuse segment betweentwo spacers, e.g., a spacer 3021 and a spacer 3041, in accordance withsome embodiments. The device 300 may be an example of the device 100shown in FIG. 1, where the fuse line 3001 may be an example of the fuseline 1001.

In embodiments, the device 300 may include the fuse line 3001. Thespacer 3021 may be next to the fuse line 3001 along a first side of thefuse line 3001, and the spacer 3041 may be next, to the fuse line 3001along a second side of the fuse line 3001 opposite to the first side ofthe fuse line 3001 where the spacer 3021 is located. The spacer 3021,the spacer 3041, and the fuse 3001 may together form a rectangle intop-down view. In addition, an interconnect line 3031 and aninterconnect line 3011 may be separated from the fuse line 3001 by thespacer 3021 or the spacer 3041, respectively, and further separated fromother interconnect lines by a spacer 3061 or a spacer 3081. Theinterconnect line 3011 and the interconnect line 3031 may be in parallelto the fuse line 3001.

The fuse line 3001 may include a necked fuse segment 3005, a nominalfuse segment 3003, and a nominal fuse segment 3007. The necked fusesegment 3005, the nominal fuse segment 3003, and the nominal fusesegment 3007 may each be a rectangle. The nominal fuse segment 3003 andthe nominal fuse segment 3007 may be abutted to the necked fuse segment3005. The nominal fuse segment 3003 or the nominal fuse segment 3007 mayhave a nominal lateral width W1, and the necked fuse segment 3005 mayhave a necked lateral width W2 that is smaller than the nominal lateralwidth W1. In embodiments, the nominal lateral width W1 may be equal to acritical dimension for an interconnect line based on a design rule. Inembodiments, the necked lateral width W2 may be in a range of 90% to 25%of the nominal lateral width W1.

The plug 3065 and the plug 3067 may interrupt the interconnect line 3011so that the interconnect line 3011 may be broken into multiple segments.Similarly the interconnect line 3031 may be broken into multiplesegments by the plug 3083 and the plug 3085. The plug 3065, the plug3067, the plug 3083, and the plug 3085 may include a same material forthe spacer 3021 or the spacer 3041.

The plug 3065 may be within a vicinity 3006 of the necked fuse segment3005. In embodiments, the vicinity 3006 may refer to an area thatoverlaps with the necked fuse segment 3005 along a direction orthogonalto the necked fuse segment 3005. The plug 3065 may be entirely containedwithin the vicinity 3006. As another example, the plug 3085 may have apart 3087 contained within the vicinity 3006, where the plug 3085 may bewithin the vicinity 3006. On the other hand, the plug 3067 and the plug3083 may be completely off the vicinity 3006. In some other embodiments,the vicinity 3006 may be an area surrounding the necked fuse segment3005, formed by a design rule based on the technology used tofabrication the device 300, and/or the application the device 300 may beused for.

In embodiments, the plug 3065 and the plug 3085, which are next to thespacer 3021 or the spacer 3041, and within the vicinity 3006, may have awidth W3. The plug 3067 and the plug 3083, which are completely out ofthe vicinity 3006, may have a width W4. The width W3 may be at leasttwice the width W4. Hence, plugs within the vicinity 3006 may be widerthan plugs outside the vicinity 3006, to provide better protection tothe interconnect line 3011 or the interconnect line 3031 around thenecked fuse segment 3005.

FIGS. 4(a)-4(e) schematically illustrate a process 400 for forming anexample semiconductor device 410 including multiple fuse lines, e.g., afuse line 4001, and a fuse line 4101, having a nominal fuse segment,e.g., a nominal fuse segment 4003, a nominal fuse segment 4103, and anecked fuse segment, e.g., a necked fuse segment 4005, a necked fusesegment 4105, between spacers, e.g., a spacer 4021, a spacer 4041, aspacer 4121, a spacer 4141, in accordance with some embodiments. Theprocess 400 may illustrate the formation of the fuse line 1001, thespacer 1021, and the spacer 1041 for the device 100 shown in FIG. 1.Similarly, the process 400 may illustrate the formation of the fuse line2001, the spacer 2021, and the spacer 2041 for the device 200 shown inFIG. 2(a).

As shown in FIG. 4(a), a mandrel line 4201, a mandrel line 4203, and amandrel line 4205 may be patterned, where the mandrel line 4201, themandrel line 4203, and the mandrel line 4205 may be in parallel.Furthermore, the mandrel line 4201, the mandrel line 4203, and themandrel line 4205 may be disposed over a substrate, not shown.

The mandrel line 4201 and the mandrel line 4203 may form a narrowerspace 4305 with a width W2, a nominal space 4303 abutted to the narrowerspace 4305, and a nominal space 4307 abutted to the narrower space 4305.The nominal space 4303 and the nominal space 4307 may have a width W1that is wider (larger) than the width W2 of the narrower space. Inaddition, the mandrel line 4201 and the mandrel line 4203 may have awidth W3 at the segments that form the nominal space 4303 and thenominal space 4307.

The mandrel line 4205 may include a necked part 4315, a nominal part4313 abutted to the necked part 4315, and a nominal part 4317 abutted tothe necked part 4315. The nominal part 4313 and the nominal part 4317may have a nominal lateral width W3, which may be the same width as thesegments of the mandrel line 4201 and the mandrel line 4203. Inaddition, the necked part 4315 may have a necked lateral width W4 thatis smaller than the nominal lateral width W3.

As shown in FIG. 4(b), a spacer 4081, a spacer 4041, a spacer 4021, aspacer 4061, a spacer 4141, and a spacer 4121 may be formed around themandrel line 4201, the mandrel line 4203, and the mandrel line 4205,respectively. The spacer 4081, the spacer 4041, the spacer 4021, thespacer 4061, the spacer 4141, and the spacer 4121 may include one ormore of silicon dioxide (SiO₂), silicon nitride (Si₃N₄), siliconoxynitride (SiON), a low-k material, or an ultra low-k material.

The spacer 4041 may be formed along edges of the mandrel line 4201. Thespacer 4041 may include a spacer segment 4043 disposed within thenominal space 4303, a spacer segment 4045 disposed within the narrowerspace 4305, and a spacer segment 4047 disposed within the nominal space4307. The spacer segment 4043, the spacer segment 4045, and the spacersegment 4047 may have a lateral width W5.

The spacer 4021 may be formed along edges of the mandrel line 4203. Thespacer 4021 may include a spacer segment 4023 disposed within thenominal space 4303, a spacer segment 4025 disposed within the narrowerspace 4305, and a spacer segment 4027 disposed within the nominal space4307. The spacer segment 4023, the spacer segment 4025, and the spacersegment 4027 may have a lateral width W6. In embodiments, the lateralwidth W5 may be the same as the lateral width W6.

In addition, an empty space 4401 may be formed between the spacer 4041and the spacer 4021. The empty space 4401 may include the remainingspace of the nominal space 4303, the remaining space of the narrowerspace 4305, and the remaining space of the nominal space 4307, afterbeing used for the spacer 4041 and the spacer 4021. The remaining spaceof the nominal space 4303 after being used for the spacer segment 4043,and the spacer segment 4023 may have a width W9. Similarly, theremaining space of the nominal space 4307 after being used for thespacer segment 4047, and the spacer segment 4027 may have a same widthW9. The remaining space of the nominal space 4305 after being used forthe spacer segment 4045, and the spacer segment 4025 may have a widthW10, which is smaller than the width W9.

The spacer 4141 may be formed along edges of the mandrel line 4205 on afirst side. The spacer 4141 may include a spacer segment 4143 next tothe nominal part 4313, a spacer segment 4145 next to the necked part4315, and a spacer segment 4147 next to the nominal part 4317. Thespacer segment 4143 and the spacer segment 4147 may have a lateral widthW7. The spacer segment 4145 may be wider than the lateral width W7because it is next to the necked part 4315.

The spacer 4121 may be formed along edges of the mandrel line 4205 on asecond side opposite to the side the spacer 4141 is formed. The spacer4121 may include a spacer segment 4123 next to the nominal part 4313, aspacer segment 4125 next to the necked part 4315, and a spacer segment4127 next to the nominal part 4317. The spacer segment 4123 and thespacer segment 4127 may have a lateral width W8. The spacer segment 4125may be wider than the lateral width W8 because it is next to the neckedpart 4315. In embodiments, the lateral width W7 may be at least twicethe lateral width W8.

An empty space 4531 may be formed between the spacer 4061 and the spacer4141. The empty space 4531 may have a width W13, which may besubstantially the same as the width W9.

As shown in FIG. 4(c), the mandrel line 4201, the mandrel line 4203, andthe mandrel line 4205 may be removed. An empty space 4431 may be createdbetween the spacer 4081 and the spacer 4041 when the mandrel line 4201is removed. An empty space 4411 may be created between the spacer 4021and the spacer 4061 when the mandrel line 4203 is removed. Similarly, anempty space 4501 may be created between the spacer 4141 and the spacer4121 when the mandrel line 4205 is removed. The empty space 4431, theempty space 4411, and the empty space 4501 formed by removing themandrel lines, together with the empty space 4401 and the empty space4531 formed between spacers, may be used to form fuse lines as shown inFIG. 4(d).

As shown in FIG. 4(d), a fuse line 4001 may be formed within the emptyspace 4401 between the spacer 4021 and the spacer 4041. A fuse line 4101may be formed in the empty space 4501, which is the space occupied bythe mandrel line 4205 before it is removed. In addition, moreinterconnect lines, e.g., an interconnect line 4031, an interconnectline 4011, and an interconnect line 4131 may be formed in the emptyspace 4431, the empty space 4411, and the empty space 4531. Theinterconnect line 4031, the interconnect line 4011, and the interconnectline 4131 may be parallel to the fuse line 4001 and the fuse line 4101.

The fuse line 4001 may include a nominal fuse segment 4003 formed withinthe nominal space 4303, a necked fuse segment 4005 formed within thenarrower space 4305, and a nominal fuse segment 4007 formed within thenominal space 4307. The fuse line 4101 may include a nominal fusesegment 4103 in a space for the nominal part 4313 of the mandrel line4205, a necked fuse segment 4105 in a space for the necked part 4315 ofthe mandrel line 4205, and a nominal fuse segment 4107 in a space forthe nominal part 4317 of the mandrel line 4205. In embodiments, thenominal fuse segment 4103 may have a nominal lateral width W3, thenecked fuse segment 4105 may have a necked lateral width W4, and thenecked lateral width W4 may be in a range of 90% to 25% of the nominallateral width W3, in embodiments, the nominal fuse segment 4003 may havethe nominal lateral width W9, the necked fuse segment 4005 may have thenecked lateral width W10, and the necked lateral width W10 may be in arange of 90% to 25% of the nominal lateral width W9.

As shown in FIG. 4(e), additional plugs may be formed on theinterconnect lines in various positions. A plug 4163 may be formed onthe interconnect line 4131 and may have a width W12. A plug 4085 may beformed on the interconnect line 4031 and may have a width W12.

A plug 4165 may be formed on the interconnect line 4131 and may have awidth W11. A plug 4065 may be formed on the interconnect line 4011 andmay have a width W11. The plug 4165 may be next to the spacer 4141, andthe plug 4065 may be next to the spacer 4021. A part of the plug 4165may overlaps with the necked fuse segment 4105 in a direction orthogonalto the necked fuse segment 4105. A part of the plug 4065 may overlapwith the necked fuse segment 4005 in a direction orthogonal to thenecked fuse segment 4005. The plug width W11 may be at least twice theplug width W12.

FIG. 5 schematically illustrates another process 500 for forming anexample semiconductor device including a fuse line having a nominal fusesegment and a necked fuse segment between spacers, in accordance withsome embodiments. In embodiments, the process 500 may be applied to formthe semiconductor device 100 as shown in FIG. 1, or the semiconductordevice 300 as shown in FIG. 3. In embodiments, the process 500 may be anexample of the process 400 shown in FIG. 4.

At block 501, the process 500 may include patterning a first mandrelline disposed over a substrate and the first mandrel line may have anecked part. The first mandrel line may also include a first nominalpart abutted to the necked part, and a second nominal part abutted tothe necked part. The first nominal part and the second nominal part mayhave a nominal lateral width, and the necked part may have a neckedlateral width that is smaller than the nominal lateral width. Forexample, in embodiment, the process 500 may include forming the mandrelline 4205 as illustrated in FIG. 4(a). The mandrel line 4205 may includea necked part 4315, a nominal part 4313 abutted to the necked part 4315,and a nominal part 4317 abutted to the necked part 4315. The nominalpart 4313 and the nominal part 4317 may have a nominal lateral width W3.In addition, the necked part 4315 may have a necked lateral width W4that is smaller than the nominal lateral width W3.

At block 503, the process 500 may include forming a first spacer alongedges of the first mandrel line on a first side. The first spacer mayinclude a first spacer segment next to the first nominal part, and asecond spacer segment next to the necked part, the first spacer segmenthas a first lateral width. For example, in embodiment, the process 500may include forming the spacer 4121 along edges of the mandrel line 4205as illustrated in FIG. 4(b). The spacer 4121 may include a spacersegment 4123 next to the nominal part 4313, and a spacer segment 4125next to the necked part 4315. The spacer segment 4123 may have a lateralwidth W8.

At block 505, the process 500 may include forming a second spacer alongedges of the first mandrel line on a second side opposite to the firstside. The second spacer may include a third spacer segment next to thefirst nominal part, and a fourth spacer segment next to the necked part.The third spacer segment may have a second lateral width that is atleast twice the first lateral width. For example, in embodiment, theprocess 500 may include forming the spacer 4141 along edges of themandrel line 4205 on a second side opposite to the first side where thespacer 4121 is located, as illustrated in FIG. 4(b). The spacer 4141 mayinclude a spacer segment 4143 next to the nominal part 4313, and aspacer segment 4145 next to the necked part 4315. The spacer segment4143 may have a lateral width W7 that is at least twice the lateralwidth W8.

At block 507, the process 500 may include removing the first mandrelline selectively from the first spacer and the second spacer. Forexample, the process 500 may include removing the mandrel line 4205selectively from the spacer 4141 and the spacer 4121, leaving the emptyspace 4501 to form a fuse line, as shown in FIG. 4(c).

At block 509, the process 500 may include forming a fuse line betweenthe first spacer and the second spacer. The fuse line may include anominal fuse segment in a space for the first nominal part of the firstmandrel line, and a necked fuse segment in a space for the necked partof the first mandrel line. For example, the process 500 may includeforming the fuse line 4101 between the spacer 4141 and the spacer 4121.The fuse line 4101 may include a nominal fuse segment 4103 in a spacefor the nominal part 4313 of the mandrel line 4205, and a necked fusesegment 4105 in a space for the necked part 4315 of the mandrel line4205, as shown in FIG. 4(d).

FIG. 6 illustrates an interposer 600 that includes one or moreembodiments of the disclosure. The interposer 600 is an interveningsubstrate used to bridge a first substrate 602 to a second substrate604. The first substrate 602 may be, for instance, an integrated circuitdie, including the semiconductor device 100 shown in FIG. 1, thesemiconductor device 200 shown in FIG. 2(a), the semiconductor device210 shown in FIG. 2(b), or the semiconductor device 300 shown in FIG. 3.For examples, the first substrate 602 may be an integrated circuit dieincluding multiple fins having multiple cut regions with orthogonalcorners on the multiple fins based on multiple masks formed by usingsacrificial layers with embedded grating lines. The second substrate 604may be, for instance, a memory module, a computer motherboard, oranother integrated circuit die. Generally, the purpose of an interposer600 is to spread a connection to a wider pitch or to reroute aconnection to a different connection. For example, an interposer 600 maycouple an integrated circuit die to a ball grid array (BGA) 606 that cansubsequently be coupled to the second substrate 604. In someembodiments, the first and second substrates 602/604 are attached toopposing sides of the interposer 600. In other embodiments, the firstand second substrates 602/604 are attached to the same side of theinterposer 600. And in further embodiments, three or more substrates areinterconnected by way of the interposer 600.

The interposer 600 may be formed of an epoxy resin, afiberglass-reinforced epoxy resin, a ceramic material, or a polymermaterial such as polyimide. In further implementations, the interposermay be formed of alternate rigid or flexible materials that may includethe same materials described above for use in a semiconductor substrate,such as silicon, germanium, and other group III-V and group IVmaterials.

The interposer may include metal interconnects 608 and vias 610,including but not limited to through-silicon vias (TSVs) 612. Theinterposer 600 may further include embedded devices 614, including bothpassive and active devices. Such devices include, but are not limitedto, capacitors, decoupling capacitors, resistors, inductors, fuses,diodes, transformers, sensors, and electrostatic discharge (ESD)devices, More complex devices such as radio-frequency (RF) devices,power amplifiers, power management devices, antennas, arrays, sensors,and MEMS devices may also be formed on the interposer 600.

In accordance with embodiments of the disclosure, apparatuses orprocesses disclosed herein may be used in the fabrication of interposer600.

FIG. 7 illustrates a computing device 700 in accordance with oneembodiment of the disclosure. The computing device 700 may include anumber of components. In one embodiment, these components are attachedto one or more motherboards. In an alternate embodiment, some or all ofthese components are fabricated onto a single system-on-a-chip (SoC)die, such as a SoC used for mobile devices. The components in thecomputing device 700 include, but are not limited to, an integratedcircuit die 702 and at least one communications logic unit 708. In someimplementations the communications logic unit 708 is fabricated withinthe integrated circuit die 702 while in other implementations thecommunications logic unit 708 is fabricated in a separate integratedcircuit chip that may be bonded to a substrate or motherboard that isshared with or electronically coupled to the integrated circuit the 702.The integrated circuit the 702 may include a CPU 704 as well as on-diememory 706, often used as cache memory, which can be provided bytechnologies such as embedded DRAM (eDRAM), SRAM, or spin-transfertorque memory (STT-MRAM).

Computing device 700 may include other components that may or may not bephysically and electrically coupled to the motherboard or fabricatedwithin a SoC die. These other components include, but are not limitedto, volatile memory 710 (e.g., DRAM), non-volatile memory 712 (e.g., ROMor flash memory), a graphics processing unit 714 (GPU), a digital signalprocessor 716, a crypto processor 742 (e.g., a specialized processorthat executes cryptographic algorithms within hardware), a chipset 720,at least one antenna 722 (in some implementations two or more antennamay be used), a display or a touchscreen display 724, a touchscreencontroller 726, a battery 728 or other power source, a power amplifier(not shown), a voltage regulator (not shown), a global positioningsystem (GPS) device 728, a compass 730, a motion coprocessor or sensors732. (that may include an accelerometer, a gyroscope, and a compass), amicrophone (not shown), a speaker 734, a camera 736, user input devices738 (such as a keyboard, mouse, stylus, and touchpad), and a massstorage device 740 (such as hard disk drive, compact disk (CD), digitalversatile disk (DVD), and so forth). The computing device 700 mayincorporate further transmission, telecommunication, or radiofunctionality not already described herein. In some implementations, thecomputing device 700 includes a radio that is used to communicate over adistance by modulating and radiating electromagnetic waves in air orspace. In further implementations, the computing device 700 includes atransmitter and a receiver (or a transceiver) that is used tocommunicate over a distance by modulating and radiating electromagneticwaves in air or space.

The communications logic unit 708 enables wireless communications forthe transfer of data to and from the computing device 700. The term“wireless” and its derivatives may be used to describe circuits,devices, systems, methods, techniques, communications channels, etc.,that may communicate data through the use of modulated electromagneticradiation through a non-solid medium. The term does not imply that theassociated devices do not contain any wires, although in someembodiments they might not. The communications logic unit 708 mayimplement any of a number of wireless standards or protocols, includingbut not limited to Wi-Fi (IEEE 802.11 family), WiMAX. (IEEE 802.16family), IEEE 802.20, long term evolution (LTE), Ev-DO, HSPA+, HSDPA+,HSUPA+, EDGE, GSM, GPRS, CDMA, TDMA, DECT, Infrared (IR), Near FieldCommunication (NFC), Bluetooth, derivatives thereof, as well as anyother wireless protocols that are designated as 3G, 4G, 5G, and beyond.The computing device 700 may include a plurality of communications logicunits 708. For instance, a first communications logic unit 708 may bededicated to shorter range wireless communications such as Wi-Fi, NFC,and Bluetooth and a second communications logic unit 708 may bededicated to longer range wireless communications such as GPS, EDGE,GPRS, CDMA, WiMAX, LIE, Ev-DO, and others.

The processor 704 of the computing device 700 includes one or moredevices, such as semiconductor devices, that are formed in accordancewith embodiments of the current disclosure, e.g., the semiconductordevice 100 shown in FIG. 1, the semiconductor device 200 shown in FIG.2(a), the semiconductor device 210 shown in FIG. 2(b), the semiconductordevice 300 shown in FIG. 3, a semiconductor device fabricated using theprocess 400 shown in FIG. 4, or a semiconductor device fabricated usingthe process 500 shown in FIG. 5. The term “processor” may refer to anydevice or portion of a device that processes electronic data fromregisters and/or memory to transform that electronic data into otherelectronic data that may be stored in registers and/or memory.

The communications logic unit 708 may also include one or more devices,such as semiconductor devices, that are formed in accordance withembodiments of the current disclosure, e.g., the semiconductor device100 shown in FIG. 1, the semiconductor device 200 shown in FIG. 2(a),the semiconductor device 210 shown in FIG. 2(b), the semiconductordevice 300 shown in FIG. 3, a semiconductor device fabricated using theprocess 400 shown in FIG. 4, or a semiconductor device fabricated usingthe process 500 shown in FIG. 5.

In further embodiments, another component housed within the computingdevice 700 may contain one or more devices, such as semiconductordevices, that are formed in accordance with implementations of thecurrent disclosure, e.g., the semiconductor device 100 shown in FIG. 1,the semiconductor device 200 shown in FIG. 2(a), the semiconductordevice 210 shown in FIG. 2(b), the semiconductor device 300 shown inFIG. 3, a semiconductor device fabricated using the process 400 shown inFIG. 4, or a semiconductor device fabricated using the process 500 shownin FIG. 5.

In various embodiments, the computing device 700 may be a laptopcomputer, a netbook computer, a notebook computer, an ultrabookcomputer, a smartphone, a dumbphone, a tablet, a tablet/laptop hybrid, apersonal digital assistant (PDA), an ultra mobile PC, a mobile phone, adesktop computer, a server, a printer, a scanner, a monitor, a set-topbox, an entertainment control unit, a digital camera, a portable musicplayer, or a digital video recorder. In further implementations, thecomputing device 700 may be any other electronic device that processesdata.

The above description of illustrated implementations of the disclosure,including what is described in the Abstract, is not intended to beexhaustive or to limit the disclosure to the precise forms disclosed.While specific implementations of, and examples for, the disclosure aredescribed herein for illustrative purposes, various equivalentmodifications are possible within the scope of the disclosure, as thoseskilled in the relevant art will recognize.

Some non-limiting Examples are provided below.

Example 1 may include a semiconductor device, comprising: a fuse linedisposed over a substrate, wherein the fuse line includes a nominal fusesegment abutted to a necked fuse segment, the nominal fuse segment has anominal lateral width, and the necked fuse segment has a necked lateralwidth that is smaller than the nominal lateral width; a first spaceralong a first side of the fuse line, wherein the first spacer includes afirst part of the first spacer that is next to the nominal fuse segmentand has a first width; and a second spacer along a second side of thefuse line opposite to the first side of the fuse line, wherein thesecond spacer includes a first part of the second spacer that is next tothe nominal fuse segment and has a second width, and the second width isat least twice the first width.

Example 2 may include the device of example 1 and/or some other examplesherein, further comprising: a first plug of an interconnect line inparallel with the fuse line, wherein the first plug has a first plugwidth, and a second plug next to the first spacer or the second spacer,wherein at least a part of the second plug is located orthogonal to thenecked fuse segment of the fuse line, the second plug has a second plugwidth, and the second plug width is at least twice the first plug width.

Example 3 may include the device of example 2 and/or some other examplesherein, further comprising: a third plug next to the first spacer or thesecond spacer, wherein at least a part of the third plug is locatedorthogonal to the necked fuse segment of the fuse line, and the thirdplug has the second plug width.

Example 4 may include the device of example 1 and/or some other examplesherein, wherein the first spacer further includes a second part of thefirst spacer that is next to the necked fuse segment, and the secondspacer further includes a second part of the second spacer that is nextto the necked fuse segment.

Example 5 may include the device of example 1 and/or some other examplesherein, further comprising: a first interconnect line next to the firstspacer in parallel to the fuse line; and a second interconnect line nextto the second spacer in parallel to the fuse line.

Example 6 may include the device of any of examples 1-5 and/or someother examples herein, wherein the fuse line, the first spacer, and thesecond spacer together form a rectangle in top-down view.

Example 7 may include the device of any of examples 1-5 and/or someother examples herein, wherein the nominal lateral width is equal to acritical dimension for an interconnect line based on a design rule.

Example 8 may include the device of any of examples 1-5 and/or someother examples herein, wherein the necked lateral width is in a range of90% to 25% of the nominal lateral width.

Example 9 may include the device of any of examples 1-5 and/or someother examples herein, wherein the first spacer includes one or more ofsilicon dioxide (SiO₂), silicon nitride (Si₃N₄), silicon oxynitride(SiON), a low-k material, or an ultra low-k material.

Example 10 may include the device of any of examples 1-5 and/or someother examples herein, wherein the fuse line includes one or more ofcopper (Cu), Tungsten (W), aluminum (Al), titanium (Ti), platinum (Pt),cobalt (Co), tantalum (Ta), or an alloy of Cu, W, Al, Ti, Pt, Co, or Ta.

Example 11 may include a semiconductor device, comprising: a fuse linedisposed over a substrate, wherein the fuse line includes a nominal fusesegment abutted to a necked fuse segment, the nominal fuse segment has anominal lateral width, and the necked fuse segment has a necked lateralwidth that is smaller than the nominal lateral width; a first spaceralong a first side of the fuse line, wherein the first spacer includes afirst part of the first spacer that is next to the nominal fuse segment;a second spacer along a second side of the fuse line opposite to thefirst side of the fuse line, wherein the second spacer includes a firstpart of the second spacer that is next to the nominal fuse segment; afirst plug of an interconnect line in parallel with the fuse line,wherein the first plug has a first plug width; and a second plug next tothe first spacer or the second spacer, wherein at least a part of thesecond plug is located orthogonal to the necked fuse segment of the fuseline, the second plug has a second plug width, and the second plug widthis at least twice the first plug width.

Example 12 may include the device of example 11 and/or some otherexamples herein, wherein the first spacer further includes a second partof the first spacer that is next to the necked fuse segment, and thesecond spacer further includes a second part of the second spacer thatis next to the necked fuse segment.

Example 13 may include the device of example 11 and/or some otherexamples herein, further comprising: a third plug next to the firstspacer or the second spacer, wherein at least a part of the third plugis located orthogonal to the necked fuse segment of the fuse line, andthe third plug has the second plug width.

Example 14 may include the device of example 11 and/or some otherexamples herein, wherein the first part of the first spacer has a firstwidth, the first part of the second spacer has a second width, and thesecond width is at least twice the first width.

Example 15 may include the device of example 11 and/or some otherexamples herein, further comprising: a first interconnect line next tothe first spacer in parallel to the fuse line; and a second interconnectline next to the second spacer in parallel to the fuse line.

Example 16 may include the device of any of examples 11-15 and/or someother examples herein, wherein the nominal lateral width is equal to acritical dimension for an interconnect line based on a design rule.

Example 17 may include the device of any of examples 11-15 and/or someother examples herein, wherein the necked lateral width is in a range of90% to 25% of the nominal lateral width.

Example 18 may include the device of any of examples 11-15 and/or someother examples herein, wherein the first spacer includes one or more ofsilicon dioxide (SiO₂), silicon nitride (Si₃N₄), silicon oxynitride(SiON), a low-k material, or an ultra low-k material.

Example 19 may include the device of any of examples 11-15 and/or someother examples herein, wherein the fuse line includes one of copper(Cu), Tungsten (W), aluminum (Al), titanium. (Ti), platinum (Pt), cobalt(Co), tantalum (Ta), or an alloy of Cu, W, Al, Ti, Pt, Co, or Ta.

Example 20 may include a method of fabricating a fuse structure in asemiconductor device, the method comprising: patterning a first mandrelline with a necked part, wherein the first mandrel line is disposed overa substrate and includes a first nominal part abutted to the neckedpart, and a second nominal part abutted to the necked part, the firstnominal part and the second nominal part have a nominal lateral width,and the necked part has a necked lateral width that is smaller than thenominal lateral width; forming a first spacer along edges of the firstmandrel line on a first side, wherein the first spacer includes a firstspacer segment next to the first nominal part, and a second spacersegment next to the necked part, the first spacer segment has a firstlateral width; forming a second spacer along edges of the first mandrelline on a second side opposite to the first side, wherein the secondspacer includes a third spacer segment next to the first nominal part,and a fourth spacer segment next to the necked part, the third spacersegment has a second lateral width that is at least twice the firstlateral width; removing the first mandrel line selectively from thefirst spacer and the second spacer; and forming a fuse line between thefirst spacer and the second spacer, wherein the fuse line includes anominal fuse segment in a space for the first nominal part of the firstmandrel line, and a necked fuse segment in a space for the necked partof the first mandrel line.

Example 21 may include the method of example 20 and/or some otherexamples herein, further comprising: patterning a second mandrel lineand a third mandrel line in parallel to the first mandrel line, whereinthe second mandrel line and the third mandrel line form a narrowerspace, and a nominal space abutted to the narrower space that is widerthan the narrower space; forming a third spacer along edges of thesecond mandrel line, wherein the third spacer includes a fifth spacersegment disposed within the nominal space and a sixth spacer segmentdisposed within the narrower space, and the fifth spacer segment and thesixth spacer segment have a third lateral width; forming a fourth spaceralong edges of the third mandrel line, wherein the fourth spacerincludes a seventh spacer segment disposed within the nominal space andan eighth spacer segment disposed within the narrower space, and theseventh spacer segment and the eighth spacer segment have the thirdlateral width; removing the second mandrel line selectively from thethird spacer; removing the third mandrel fine selectively from thefourth spacer; and forming a second fuse line between the third spacerand the fourth spacer, wherein the second fuse line has a nominal fusesegment within the nominal space and a necked fuse segment within thenarrower space.

Example 22 may include the method of example 20 and/or some otherexamples herein, further comprising: forming a first plug of aninterconnect line, wherein the interconnect line is in parallel with thefuse line, and the first plug has a first plug width; and forming asecond plug next to the first spacer or the second spacer, wherein thesecond plug has a second plug width that is at least twice the firstplug width, and a part of the second plug overlaps with the necked fusesegment in a direction orthogonal to the necked fuse segment.

Example 23 may include the method of example 21 and/or some otherexamples herein, further comprising: forming a third plug of aninterconnect line, wherein the interconnect line is in parallel with thesecond fuse line, and the third plug has a third plug width; and forminga fourth plug next to the third spacer or the fourth spacer, wherein thefourth plug has a forth plug width that is at least twice the third plugwidth, and a part of the fourth plug overlaps with the sixth spacersegment or the eighth spacer segment in a direction orthogonal to thenecked fuse segment of the second fuse line.

Example 24 may include the method of any of examples 20-23 and/or someother examples herein, wherein the nominal fuse segment has the nominallateral width, the necked fuse segment has the necked lateral width, andthe necked lateral width is in a range of 90% to 25% of the nominallateral width.

Example 25 may include the method of any of examples 20-23 and/or someother examples herein, wherein the first spacer includes one or more ofsilicon dioxide (SiO₂), silicon nitride (Si₃N₄), silicon oxynitride(SiON), a low-k material, or an ultra low-k material.

Various embodiments may include any suitable combination of theabove-described embodiments including alternative (or) embodiments ofembodiments that are described in conjunctive form (and) above (e.g.,the “and” may be “and/or”). Furthermore, some embodiments may includeone or more articles of manufacture (e.g., non-transitorycomputer-readable media) having instructions, stored thereon, that whenexecuted result in actions of any of the above-described embodiments.Moreover, some embodiments may include apparatuses or systems having anysuitable means for carrying out the various operations of theabove-described embodiments.

The above description of illustrated implementations, including what isdescribed in the Abstract, is not intended to be exhaustive or to limitthe embodiments of the present disclosure to the precise formsdisclosed. While specific implementations and examples are describedherein for illustrative purposes, various equivalent modifications arepossible within the scope of the present disclosure, as those skilled inthe relevant art will recognize.

These modifications may be made to embodiments of the present disclosurein light of the above detailed description. The terms used in thefollowing claims should not be construed to limit various embodiments ofthe present disclosure to the specific implementations disclosed in thespecification and the claims. Rather, the scope is to be determinedentirely by the following claims, which are to be construed inaccordance with established doctrines of claim interpretation.

What is claimed is:
 1. A semiconductor device, comprising: a fuse linedisposed over a side of a substrate, wherein the fuse line includes anominal fuse segment abutted to a necked fuse segment, the nominal fusesegment has a nominal lateral width, and the necked fuse segment has anecked lateral width that is smaller than the nominal lateral width,wherein the fuse line has a first side and a second side opposite thefirst side, wherein the first side is entirely within a first plane andthe second side is entirely within a second plane, wherein the firstplane and the second plane are substantially parallel to the side of thesubstrate; a first spacer along a first side of the fuse line, whereinthe first spacer includes a first part of the first spacer that is nextto the nominal fuse segment and has a first width; and a second spaceralong a second side of the fuse line opposite to the first side of thefuse line, wherein the second spacer includes a first part of the secondspacer that is next to the nominal fuse segment and has a second width,and the second width is at least twice the first width.
 2. The device ofclaim 1, further comprising: a first plug of an interconnect line inparallel with the fuse line, wherein the first plug has a first plugwidth; and a second plug next to the first spacer or the second spacer,wherein at least a part of the second plug is located orthogonal to thenecked fuse segment of the fuse line, the second plug has a second plugwidth, and the second plug width is at least twice the first plug width.3. The device of claim 2, further comprising: a third plug next to thefirst spacer or the second spacer, wherein at least a part of the thirdplug is located orthogonal to the necked fuse segment of the fuse line,and the third plug has the second plug width.
 4. The device of claim 1,wherein the first spacer further includes a second part of the firstspacer that is next to the necked fuse segment, and the second spacerfurther includes a second part of the second spacer that is next to thenecked fuse segment.
 5. The device of claim 1, further comprising: afirst interconnect line next to the first spacer in parallel to the fuseline; and a second interconnect line next to the second spacer inparallel to the fuse line.
 6. The device of claim 1, wherein the fuseline, the first spacer, and the second spacer together form a rectanglein top-down view.
 7. The device of claim 1, wherein the nominal lateralwidth is equal to a critical dimension for an interconnect line based ona design rule.
 8. The device of claim 1, wherein the necked lateralwidth is in a range of 90% to 25% of the nominal lateral width.
 9. Thedevice of claim 1, wherein the first spacer includes one or more ofsilicon dioxide (SiO₂), silicon nitride (Si₃N₄), silicon oxynitride(SiON), a low-k material, or an ultra low-k material.
 10. The device ofclaim 1, wherein the fuse line includes one or more of copper (Cu),Tungsten (W), aluminum (Al), titanium (Ti), platinum (Pt), cobalt (Co),tantalum (Ta), or an alloy of Cu, W, Al, Ti, Pt, Co, or Ta.
 11. Asemiconductor device, comprising: a fuse line disposed over a side of asubstrate, wherein the fuse line includes a nominal fuse segment abuttedto a necked fuse segment, the nominal fuse segment has a nominal lateralwidth, and the necked fuse segment has a necked lateral width that issmaller than the nominal lateral width, wherein the fuse line has afirst side and a second side opposite the first side, wherein the firstside is entirely within a first plane and the second side is entirelywithin a second plane, wherein the first plane and the second plane aresubstantially parallel to the side of the substrate; a first spaceralong a first side of the fuse line, wherein the first spacer includes afirst part of the first spacer that is next to the nominal fuse segment;a second spacer along a second side of the fuse line opposite to thefirst side of the fuse line, wherein the second spacer includes a firstpart of the second spacer that is next to the nominal fuse segment; afirst plug of an interconnect line in parallel with the fuse line,wherein the first plug has a first plug width; and a second plug next tothe first spacer or the second spacer, wherein at least a part of thesecond plug is located orthogonal to the necked fuse segment of the fuseline, the second plug has a second plug width, and the second plug widthis at least twice the first plug width.
 12. The device of claim 11,wherein the first spacer further includes a second part of the firstspacer that is next to the necked fuse segment, and the second spacerfurther includes a second part of the second spacer that is next to thenecked fuse segment.
 13. The device of claim 11, further comprising: athird plug next to the first spacer or the second spacer, wherein atleast a part of the third plug is located orthogonal to the necked fusesegment of the fuse line, and the third plug has the second plug width.14. The device of claim 11, wherein the first part of the first spacerhas a first width, the first part of the second spacer has a secondwidth, and the second width is at least twice the first width.
 15. Thedevice of claim 11, further comprising: a first interconnect line nextto the first spacer in parallel to the fuse line; and a secondinterconnect line next to the second spacer in parallel to the fuseline.
 16. The device of claim 11, wherein the nominal lateral width isequal to a critical dimension for an interconnect line based on a designrule.
 17. The device of claim 11, wherein the necked lateral width is ina range of 90% to 25% of the nominal lateral width.
 18. The device ofclaim 11, wherein the first spacer includes one or more of silicondioxide (SiO₂), silicon nitride (Si₃N₄), silicon oxynitride (SiON), alow-k material, or an ultra low-k material.
 19. The device of claim 11,wherein the fuse line includes one of copper (Cu), Tungsten (W),aluminum (Al), titanium (Ti), platinum (Pt), cobalt (Co), tantalum (Ta),or an alloy of Cu, W, Al, Ti, Pt, Co, or Ta.